CLEAN ROOM

A 95 m2 clean room with material processing facilities have been constructed. The clean room has been divided into two parts, first part is being used for lithography and device processing, and the second part is being used as chemical process lab for sample and material preparation for the spectroscopy purposes. Some of the equipments needed for the operation of clean room, such as tube furnace ovens, ultra pure water system have been purchased by using university's own resources.

Scanning electron microscope (SEM) with an electron beam lithography attachment was installed in the clean room in June 2006. The SEM has been used for the imaging purposes in general. Lithography attachment has been useful to facilitate the fabrication of nanostructures at the central laboratory. Some small additional equipments like oven and spinner have been purchased to complete the lithography system.